Wafer stage, as an important module of ASML’s lithography machine, plays a crucial role in achieving high-acceleration motion and nano-meter performance. To mitigate the stage-induced vibration, an effective balance mass system has been commonly used. For the next generation wafer stage, new motion characteristics will be introduced, meaning the balance mass needs to be redesigned accordingly. In this assignment, we are aiming to design a new balance mass system for the new wafer stage, and to build a (simplified) dynamical model for analyzing system dynamics behavior. The new modular design would enable better system dynamics for improved performance, under a few challenging boundary conditions on volume, cost of goods, and stability
manufacturability, mechanical behavior and stability, costs;
This is a Master graduation internship for 9 to 12 months (40 hours a week), starting in September 2025.
You:
What we find important is: being proactive, curiosity, teamwork, critical thinking, embracing new challenges, endurance and goal-oriented
ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that diversity and inclusion is a driving force in the success of our company.
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