Within the metrology team of image alignment, we are responsible for software that measures reticle transmission or reticle reflectivity. This software started out as common software, shared between DUV and EUV platforms. After years this software started to deviate from each other, but the goal is still the same.
Investigate the current software on DUV and EUV platforms. Find the current commonalities in interfaces and implementations, starting with the model for the transmission or reflectivity. Make a plan and design on how to make the different software again as common as possible.
You will:
To be a match for this internship, you:
This is a graduate bachelor or apprentice master internship for a minimum of 5 months, for 4 to 5 days per week (at least 3 days onsite). The start date of this internship is as soon as possible.
Other requirements you need to meet
This position requires access to controlled technology, as defined in the United States Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.
ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that diversity and inclusion is a driving force in the success of our company.
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