Within ASML, the sector Development & Engineering (D&E) is responsible for the specification and the development of ASML products. This exciting position is available in the Source Laser Light Generation group, that is part of the SW EUV Source department.
We are responsible for designing, implementing and maintaining software for Laser Light Generation, Amplification and Control. We deliver fundamental software components that go into ASML's EUV Machine Source, that produces the EUV light to project images of the reticle on to the wafer. This is a crucial step in the chip production process.
You will define, document, implement, test and integrate a generic camera facility.
Definition and design:
Documentation:
Implementation:
To be a match for this internship, you:
This is a bachelor or master graduation internship for a minimum of 5 months, for 4 to 5 days per week (at least 3 days onsite). The start date of this internship is September 2025.
Other requirements you need to meet
This position requires access to controlled technology, as defined in the United States Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.
ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that diversity and inclusion is a driving force in the success of our company.
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